- Simultaneous brightfield and darkfield optical paths to capture a wide range of defect types in a single pass, such as micro-lens deformation; resist and fall-on defects; color contamination; large stains and striations;
- Selectable LED inspection and review illumination spectrum matched to CIS filter colors;
- Sensitivity consistent with requirements of advanced CIS roadmaps;
- Throughput above 110 wafers per hour at production sensitivity, for 300mm semiconductor wafers;
- Automated binning of defects by type;
- Automated sensor pass/fail dispositioning; and
- Automated color review for defect verification.
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